Particle filter for partially enclosed microelectromechanical systems
US6703675B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 20, 2002 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | Aug 20, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B7/0012
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A particle filter for a partially enclosed microelectromechanical systems that include a substrate material having at least one micro-device formed thereon. The particle filter includes a first structural layer forming a filter bottom and a second structural layer forming a filter wall. The filter bottom and filter wall are interconnected by at least one support feature to define a particle trap between the filter wall and filter bottom. The particle trap is a gap formed by mating, but non-interconnected portions of the filter wall and filter bottom that operates to trap and prevent particles from passing beyond the filter bottom into the microelectromechanical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.