System and method for dual-depth shadow-mapping
US6704025B1 · kind B1 · utility
37Cited by
12References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 31, 2001 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | Mar 13, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T15/60
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method are provided for improved shadow mapping in a graphics pipeline. Raw depth values are initially collected from two depth layers in a scene to be rendered. Shadow-map depth values are then calculated utilizing the raw depth values. The scene is then shadow mapped utilizing the shadow-map depth values in order to improve the appearance of shadows in a rendered scene. The various steps are carried out by a hardware-implemented graphics pipeline, which may include texturing or shadowing mapping hardware.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.