Developing treatment method and developing treatment unit
US6706321B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2001 |
| Grant date | Mar 16, 2004 |
| Priority date | — |
| Expiry date | Jun 25, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3028
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a method of supplying a developing solution to a surface of a substrate to perform developing treatment for the substrate, comprising a first step of supplying the developing solution to the surface of the substrate while a developing solution supply nozzle is moving relative to the substrate and a second step of developing the substrate for a first predetermined period of time, and the second step has the step of stirring the developing solution on the surface of the substrate after a second predetermined period of time from the completion of the first step. Because of stirring, the concentration of the developing solution on the substrate is made uniform, resulting in a rise in the uniformity of developing treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.