Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure
US6709790B1 · kind B1 · utility
5Cited by
20References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 2, 1996 |
| Grant date | Mar 23, 2004 |
| Priority date | — |
| Expiry date | Jan 2, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate surface 10 having a photo-sensitive material surface thereon is simultaneously exposed to four plane waves of light at angles of incidence &thgr;, −&thgr;, &phgr; and −&phgr; subtending from the normal of the surface. The four plane waves create an interference pattern on the substrate so as to cause the formation of a periodic structure on the photo-sensitive material surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.