Edward J. Gratrix
16Patents
4h-index
11Co-inventors
57Inventor score
Filing activity: Feb 25, 1991 → Mar 14, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9941148B2 | Wafer pin chuck fabrication and repair | Electricity | 10 | Active |
| US6820445B2 | Attachment of optical elements | Physics | 9 | Expired |
| US5148319A | System for fabricating micro optical elements | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6709790B1 | Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure | Physics | 5 | Expired |
| US11623319B2 | Machine for finishing a work piece, and having a highly controllable treatment tool | Performing Operations; Transporting | 1 | Active |
| US12122012B2 | Machine for finishing a work piece, and having a highly controllable treatment tool | Performing Operations; Transporting | 0 | Active |
| US10953513B2 | Method for deterministic finishing of a chuck surface | Performing Operations; Transporting | 0 | Active |
| US10580680B2 | Methods for masking a pin chuck, and articles made thereby | Electricity | 0 | Active |
| US10242905B2 | Wafer pin chuck fabrication and repair | Electricity | 0 | Active |
| US10790181B2 | Wafer chuck featuring reduced friction support surface | Performing Operations; Transporting | 0 | Active |
| US10702968B2 | Machine for finishing a work piece, and having a highly controllable treatment tool | Performing Operations; Transporting | 0 | Active |
| US10679884B2 | Film electrode for electrostatic chuck | Electricity | 0 | Active |
| US10792778B2 | Method for removing contamination from a chuck surface | Electricity | 0 | Active |
| US11524365B2 | Inert gas-assisted laser machining of ceramic-containing articles | Performing Operations; Transporting | 0 | Active |
| US11370082B2 | Diamond composite CMP pad conditioner | Performing Operations; Transporting | 0 | Active |
| US11752594B2 | Articles having diamond-only contact surfaces | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.