Process for manufacturing integrated chemical microreactors of semiconductor material
US6710311B2 · kind B2 · utility
15Cited by
13References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2001 |
| Grant date | Mar 23, 2004 |
| Priority date | — |
| Expiry date | Dec 27, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/053
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The microreactor is completely integrated and is formed by a semiconductor body having a surface and housing at least one buried channel accessible from the surface of the semiconductor body through two trenches. A heating element extends above the surface over the channel and a resist region extends above the heating element and defines an inlet reservoir and an outlet reservoir. The reservoirs are connected to the trenches and have, in cross-section, a larger area than the trenches. The outlet reservoir has a larger area than the inlet reservoir. A sensing electrode extends above the surface and inside the outlet reservoir.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.