Exposure apparatus and exposure method
US6710850B2 · kind B2 · utility
12Cited by
5References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2001 |
| Grant date | Mar 23, 2004 |
| Priority date | — |
| Expiry date | Dec 20, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reticle stage moves while holding the reticle. A stage controller detects the acceleration of the reticle stage based on the results of detection of an laser interference system. A main control system controls movement of the reticle stage so that the acceleration detected by the reticle stage becomes within a predetermined range of acceleration of the reticle stage where offset will not occur in the reticle. An image of the pattern formed on the reticle is transferred to a wafer through a projection optical system while synchronously moving the reticle and the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.