Method for improving the stability of amorphous silicon
US6713400B1 · kind B1 · utility
3Cited by
12References
15Claims
0Family size
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Key dates
| Filing date | Nov 16, 2000 |
| Grant date | Mar 30, 2004 |
| Priority date | — |
| Expiry date | Nov 16, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2962
Abstract
A method of producing a metastable degradation resistant amorphous hydrogenated silicon film is provided, which comprises the steps of growing a hydrogenated amorphous silicon film, the film having an exposed surface, illuminating the surface using an essentially blue or ultraviolet light to form high densities of a light induced defect near the surface, and etching the surface to remove the defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.