Resist and etching by-product removing composition and resist removing method using the same
US6713440B2 · kind B2 · utility
2Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2002 |
| Grant date | Mar 30, 2004 |
| Priority date | — |
| Expiry date | Jun 30, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.