Discharge source with gas curtain for protecting optics from particles
US6714624B2 · kind B2 · utility
18Cited by
7References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 18, 2001 |
| Grant date | Mar 30, 2004 |
| Priority date | — |
| Expiry date | Jun 25, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/007
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.