Method and apparatus for evaluating the runability of a photomask inspection tool
US6721695B1 · kind B1 · utility
38Cited by
5References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 20, 2001 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Jul 11, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus evaluates the runability of a photomask inspection tool that inspects plural sets of die, each die having a standard simulated industrial device feature at plural technology nodes. A technology node size is determined for each feature at which inspection by the tool provides no false detection of faults. A sensitivity module included on a photomask test plate along with a runability module allows determination of inspection tool sensitivity and runability in a single test sequence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.