Method of manufacturing metallic film consisting of giant single crystal grains
US6723186B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2001 |
| Grant date | Apr 20, 2004 |
| Priority date | — |
| Expiry date | Jul 30, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing a metallic film consisting of giant single crystal grains is disclosed. The method includes depositing the metallic film on a substrate under an atmosphere of an inert gas and a specified additive gas to change a surface energy, grain boundary energy, or internal strain energy of the metallic film. The method also includes annealing step of the resultant of the deposition at a temperature suitable for the grain growth of the metallic film containing the additive gases. According to the method, the metallic film consisting of giant single crystal grains having a grain size whose ratio of thickness to an average grain size of the film is above 50 can be produced without depending upon the kind of substrate and deposition method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.