Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus
US6723226B1 · kind B1 · utility
17Cited by
4References
8Claims
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Key dates
| Filing date | Apr 12, 1996 |
| Grant date | Apr 20, 2004 |
| Priority date | — |
| Expiry date | Apr 12, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
In forming an electrolytic water, pure water or ultra-pure water is added to at least one solid supporting electrolyte selected from the group consisting of oxalic acid, ammonium oxalate, ammonium formate, ammonium bicarbonate, and ammonium tartrate to prepare a solution saturated with the supporting electrolyte. The solution containing the supporting electrolyte is subjected to hydrolysis to obtain an anodic water and a cathodic water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.