Semiconductor processing component having low surface contaminant concentration
US6723437B2 · kind B2 · utility
3Cited by
24References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2002 |
| Grant date | Apr 20, 2004 |
| Priority date | — |
| Expiry date | Feb 19, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.