Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
US6723486B2 · kind B2 · utility
25Cited by
3References
19Claims
0Family size
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Key dates
| Filing date | May 8, 2001 |
| Grant date | Apr 20, 2004 |
| Priority date | — |
| Expiry date | May 8, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.