Method for automatic organization of microstructures or nanostructures and related device obtained
US6724017B2 · kind B2 · utility
15Cited by
3References
26Claims
0Family size
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Key dates
| Filing date | Mar 28, 2003 |
| Grant date | Apr 20, 2004 |
| Priority date | — |
| Expiry date | Mar 28, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/605
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a device comprising microstructures or nanostructures on a support, characterized in that the support comprises:a) a substrate (1) comprising at least one part composed of a crystalline material, this part having a surface (2) with a stress field or a topology associated with a stress field, the stress field being associated with dislocations,b) an intermediate layer (3) bonded to the surface (2), and having a thickness and/or composition and/or a surface state enabling transmission of said stress field through this layer as far as its free face that supports microstructures or nanostructures (4).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.