Method of treating metal analysis sample and device thereof
US6726739B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 24, 2002 |
| Grant date | Apr 27, 2004 |
| Priority date | — |
| Expiry date | Sep 6, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/2022
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides a pre-treatment apparatus for an analytical metal sample, the apparatus including (1) a treatment chamber having a sample charging port which can be opened and closed and provided at the top of the chamber, a sample discharging port which can be opened and closed and provided at the bottom of the chamber, and a gas inlet and gas outlet, (2) a sample carrying bar joined to a sample holder also used as a sputtering electrode, and provided to pass through at least one side wall of the treatment chamber so as to be substantially horizontally movable and axially rotatable, and (3) a sputtering counter electrode at least having portions arranged opposite to each other in a region not inhibiting the charge and discharge of an analytical metal sample so that the sample holder can be arranged in the counter electrode. The present invention also provides a pre-treatment method capable of simply cleaning the surface of the analytical metal sample by using the pre-treatment apparatus and preventing re-contamination of the cleaned sample by exposure to the air or the like. Furthermore, the present invention provides an analysis apparatus provided with the pre-trea…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.