Integrated device based upon semiconductor technology, in particular chemical microreactor
US6727479B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 22, 2002 |
| Grant date | Apr 27, 2004 |
| Priority date | — |
| Expiry date | Apr 22, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L2300/1894
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An integrated device based upon semiconductor technology, in particular a chemical microreactor, including a semiconductor body having a high-temperature operating portion and a low-temperature operating portion. The semiconductor body is provided with a thermal-insulation device including a dissipator element arranged between the high-temperature operating portion and the low-temperature operating portion. The dissipator includes a membrane connecting the high-temperature operating portion and the low-temperature operating portion, and a plurality of diaphragms that extend substantially orthogonal to the membrane and are parallel to one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.