Method and apparatus for detecting contaminating species on a wafer edge
US6727494B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 18, 2001 |
| Grant date | Apr 27, 2004 |
| Priority date | — |
| Expiry date | Jan 26, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/117497
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and an apparatus for detecting contaminating species such as metal particles on a wafer edge from a semiconductor fabrication process are disclosed. In the method, a wafer is suspended and rotated in a container with a volume of solvent at a bottom portion of the container such that only an edge portion of the wafer is exposed to the solvent. After the wafer is turned in the solvent such that the entire edge portion of the wafer has been exposed to the solvent, the solvent may be removed for analyzing in an electronic instrument for detecting the species of contaminating particles. The apparatus further includes a wafer mounting device for supporting the wafer which can be adjusted in height to suit wafers of different diameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.