Apparatus and method for pattern exposure and method for adjusting the apparatus
US6727980B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 2001 |
| Grant date | Apr 27, 2004 |
| Priority date | — |
| Expiry date | May 2, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70258
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source so as to imprint a mask pattern on a substrate base. The apparatus uses a wide bandwidth light source for the exposure light source that produces exposure light and non-exposure light having wavelengths different from those in the exposure light, and optical adjustments for optical components in at least a portion of the illumination optics are performed by using non-exposure light
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.