Antireflective SiO-containing compositions for hardmask layer

US6730454B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Dirk Pfeiffer · Dobbs Ferry, US
• Marie Angelopoulos · Briarcliff Manor, US
• Katherina Babich · Chappaqua, US
• Phillip Brock · Sunnyvale, US
• Wu-Song Huang · Brewster, US
• Arpan Mahorowala · West Linn, US
• David R. Medeiros · Dobbs Ferry, US
• Ratnam Sooriyakumaran · San Jose, US

Key dates

• Filing date: Apr 16, 2002
• Grant date: May 4, 2004
• Expiry date: May 28, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/151
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.