Process apparatus
US6733620B1 · kind B1 · utility
77Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 6, 2000 |
| Grant date | May 11, 2004 |
| Priority date | — |
| Expiry date | Sep 11, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention provides a process apparatus including an airtight process vessel, an exhaust system for exhausting gas from the process vessel, and a baffle plate for partitioning the process vessel into a process chamber for processing an object and an exhaust passage communicating with the exhaust system, the baffle plate has a plurality of slits through which the process chamber and the exhaust passage communicate with each other, and each of the slits has a tapered surface on an inner surface toward the process chamber, the tapered surface corresponding to not less than ¼ of a depth of the slit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.