Load-lock chamber and exposure apparatus using the same
US6734950B2 · kind B2 · utility
15Cited by
4References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 13, 2001 |
| Grant date | May 11, 2004 |
| Priority date | — |
| Expiry date | Oct 1, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a load-lock chamber for loading and unloading a reticle or a wafer into and out of an exposure apparatus, which includes a table having a slotted flat plane for carrying thereon one or more reticles or wafers, a combination of an elevation shaft and an elevation driving unit, for moving the table upwardly and downwardly, a receiving bore for receiving the table with a small clearance maintained between the bore and a side wall of the table, and a load-lock chamber main assembly operable to move the table into the bore and to accommodate or discharge the table with a reticle or a wafer being carried thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.