Photolithographic molecular fluorine laser system
US6741627B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 27, 2002 |
| Grant date | May 25, 2004 |
| Priority date | — |
| Expiry date | Jan 12, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2258
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.