Porous silica coating with low dielectric constant, semiconductor device and coating composition
US6746714B2 · kind B2 · utility
2Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2003 |
| Grant date | Jun 8, 2004 |
| Priority date | — |
| Expiry date | Apr 22, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating composition having an aluminum-containing polysilazane and a polyacrylate or polymethacrylate ester in an organic solvent and methods of producing the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.