Tomoko Aoki
10Patents
5h-index
16Co-inventors
59Inventor score
Filing activity: Nov 4, 1991 → Aug 4, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5459114A | Method for producing ceramic products | Chemistry; Metallurgy | 34 | Expired |
| US6767641B1 | Method for sealing fine groove with siliceous material and substrate having siliceous coating formed thereon | Emerging Cross-Sectional Technologies | 23 | Expired |
| US7754003B2 | Coating composition and low dielectric siliceous material produced by using same | Emerging Cross-Sectional Technologies | 15 | Active |
| US5436398A | Polymetalosilazane, process of producing same, silicon nitride based ceramic, and process of preparing same | Chemistry; Metallurgy | 10 | Expired |
| US6310168A | Aminated polysilazane and process for the preparation thereof | Chemistry; Metallurgy | 8 | Expired |
| US5248803A | Silane compound and processes for the preparation thereof | Chemistry; Metallurgy | 5 | Expired |
| US5142082A | Silane compound and processes for the preparation thereof | Chemistry; Metallurgy | 5 | Expired |
| US5359114A | Silane compound and processes for the preparation thereof | Chemistry; Metallurgy | 3 | Expired |
| US6746714B2 | Porous silica coating with low dielectric constant, semiconductor device and coating composition | Electricity | 2 | Expired |
| US7368491B2 | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.