Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6747282B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2002 |
| Grant date | Jun 8, 2004 |
| Priority date | — |
| Expiry date | Jun 10, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
One example of a lithographic projection apparatus includes an image sensing device configured and arranged to measure a pattern in a patterned projection beam. The image sensing device includes a slab and a radiation-sensitive sensor that is sensitive to the radiation of the projection beam. The image sensing device also includes a film of a material that is non-transparent to the radiation of the projection beam. This film is provided over the sensor and includes one or more patterned segments to selectively pass radiation of the projection beam to the sensor. The apparatus also includes an intermediate plate made from a material having a thermal expansion coefficient below approximately 12×10−6K−1 and having a slab-bearing surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.