Pattern generator
US6747783B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 29, 2000 |
| Grant date | Jun 8, 2004 |
| Priority date | — |
| Expiry date | Aug 29, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2201/0414
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An apparatus is provided for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further includes an electronic data processing and delivery system feeding drive signals to the modulator, a precision mechanical system for moving said workpiece and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. The drive signals can set a modulating element to a number of states larger than two.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.