Liquid crystal display device and fabrication method thereof
US6762802B2 · kind B2 · utility
76Cited by
6References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 2001 |
| Grant date | Jul 13, 2004 |
| Priority date | — |
| Expiry date | Aug 2, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13629
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a novel photolithography processes using photoresist pattern having at least two areas which has different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithography processes required for whole of the fabrication process of the liquid crystal display device, and improve brightness of the liquid crystal display device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.