Exposure apparatus and manufacturing method using the same
US6762822B2 · kind B2 · utility
0Cited by
14References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2003 |
| Grant date | Jul 13, 2004 |
| Priority date | — |
| Expiry date | Apr 7, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for transferring a pattern of a mask onto a substrate. The apparatus includes a door and a sensor for detecting ozone in a space enclosed by the door. Opening of the door is prohibited when ozone concentration detected by the sensor is not less than a predetermined value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.