Over-coating composition for photoresist, and processes for forming photoresist patterns using the same
US6764806B2 · kind B2 · utility
12Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2000 |
| Grant date | Jul 20, 2004 |
| Priority date | — |
| Expiry date | Jan 12, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.