Patent · US Expired

Method and apparatus for producing large, single-crystals of aluminum nitride

US6770135B2 · kind B2 · utility

36Cited by
8References
34Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 20, 2002
Grant dateAug 3, 2004
Priority date
Expiry dateDec 20, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/10
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method and apparatus for producing bulk single crystals of AlN includes a crystal growth enclosure with Al and N2 source material therein, capable of forming bulk crystals. The apparatus maintains the N2 partial pressure at greater than stoichiometric pressure relative to the Al within the crystal growth enclosure, while maintaining the total vapor pressure in the crystal growth enclosure at super-atmospheric pressure. At least one nucleation site is provided in the crystal growth enclosure, and provision is made for cooling the nucleation site relative to other locations in crystal growth enclosure. The Al and N2 vapor is then deposited to grow single crystalline AlN at the nucleation site.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.