Negative resist composition, process for forming resist patterns, and process for manufacturing electron device
US6770417B2 · kind B2 · utility
9Cited by
5References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2001 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Jan 14, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative resist composition comprises at least a constituent component which has a vinyl ether structure protected with an acetal in a molecule thereof. In the formation of negative resist patterns, an aqueous basic solution can be used without swelling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.