Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films
US6770572B1 · kind B1 · utility
15Cited by
19References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 20, 2000 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Mar 13, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for treating a silica film on a substrate, which includes reacting a suitable silica film with an effective amount of a surface modification agent, wherein the silica film is present on a substrate. The reaction is conducted under suitable conditions and for a period of time sufficient for the surface modification agent to form a hydrophobic coating on the film. The surface modification agent includes at least one type of oligomer or polymer reactive with silanols on the silica film. Dielectric films and integrated circuits including such films are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.