Illumination system with field mirrors for producing uniform scanning energy
US6770894B1 · kind B1 · utility
6Cited by
15References
32Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 25, 2000 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Feb 25, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to an illumination system for scanning lithography with wavelengths ≦193 nm, particularly EUV lithography, for the illumination of a slit. The illumination system includes a light source, and a field lens group. The field lens group is shaped so that an illuminated field is distorted in a plane of a reticle perpendicular to a scanning direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.