Patent · US Expired

Metal-insulator-metal capacitor and a method for producing same

US6774425B2 · kind B2 · utility

6Cited by

3References

16Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Rudolf Lachner · Ingolstadt, DE
Michael Schrenk · Dießen am Ammersee, DE
Markus Schwerd · Holzkirchen, DE

Key dates

Filing date	Oct 15, 2002
Grant date	Aug 10, 2004
Priority date	—
Expiry date	Oct 15, 2022

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A capacitor stack in a layer structure of an integrated component has the same layer sequence as an adjacent interconnect, with the exception of a dielectric interlayer. This significantly facilitates the fabrication of vias.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.