Exposure apparatus and device manufacturing method using the same
US6774982B2 · kind B2 · utility
6Cited by
11References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 8, 2001 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Nov 8, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light outputted from a continuous emission laser, a projection optical system for projecting the illuminated pattern onto a subject to be exposed, and an interferometer, of a Fizeau type, being operable while using laser light outputted from the continuous emission laser.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.