Method and device for thermally treating objects
US6775471B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2003 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Mar 5, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D23/1917
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The invention relates to a method and to a device for thermally treating objects. The aim of the invention is to facilitate a better control of the temperature profile of an object to be thermally treated. To this end, the invention provides a method and a device for thermally treating an object in a heating system, especially for treating semiconductor wafers (2) in a rapid heating system (1). The objects are thermally treated at a predetermined temperature progression and the temperature of the object is controlled via a PID control and a feedforward control that are based on a simulation model of the heating system and the object. Said model consists of individual models of components of the heating system and/or the object. The parameters of at least one of the individual models are monitored during the thermal treatment and the model is adapted to the monitored parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.