Method of manufacturing an ultra high saturation moment soft magnetic thin film
US6776891B2 · kind B2 · utility
10Cited by
9References
14Claims
0Family size
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Key dates
| Filing date | May 18, 2001 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | May 17, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12493
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for forming a plated magnetic thin film of high saturation magnetization and low coercivity having the general form Co100−a−bFeaMb, where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.