Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members
US6783875B2 · kind B2 · utility
429Cited by
8References
54Claims
0Family size
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Key dates
| Filing date | Apr 16, 2001 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | Apr 16, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/263
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A halogen gas plasma-resistant member to be exposed to a halogen gas plasma, includes a main body of said member, and a corrosion-resistant film formed at least a surface of said main body, wherein a peeling resistance of the corrosive film to said main body is not less than 15 MPa.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.