Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits
US6786977B2 · kind B2 · utility
2Cited by
2References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2003 |
| Grant date | Sep 7, 2004 |
| Priority date | — |
| Expiry date | Nov 21, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/8305
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Gas-expanded liquids, methods of use thereof, and systems of using gas-expanded liquids are provided. One exemplary system, among others, includes: a gas-expanded liquid system comprising a gas and a liquid, wherein the gas-expanded liquid system is adapted to generate a gas-expanded liquid; and a substrate handling system adapted to position a substrate having a photoresist layer so that the gas-expanded liquid can be made to contact the substrate to remove the photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.