Inventor · Atlanta, GA, US

Dennis W. Hess

11Patents
4h-index
20Co-inventors
60Inventor score

Filing activity: Oct 16, 1987 → Feb 20, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US6764552B1 Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials Chemistry; Metallurgy 65 Expired
US4863755A Plasma enhanced chemical vapor deposition of thin films of silicon nitride from cyclic organosilicon nitrogen precursors Electricity 61 Expired
US8679359B2 Low temperature metal etching and patterning Electricity 4 Active
US6627588B1 Method of stripping photoresist using alcohols Electricity 4 Expired
US6905556B1 Method and apparatus for using surfactants in supercritical fluid processing of wafers Chemistry; Metallurgy 3 Expired
US6786977B2 Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits Emerging Cross-Sectional Technologies 2 Expired
US8790594B2 Patterning of surfaces to control the storage, mobility and transport of liquids for microfluidic applications Performing Operations; Transporting 2 Active
US10458037B2 Systems and methods for producing anti-wetting structures on metallic surfaces Chemistry; Metallurgy 0 Active
US12145147B2 Microfluidic devices and method of making same Performing Operations; Transporting 0 Active
US11447870B2 Method for forming water repellent, long-term durable and biomimetic coatings from methyltrimethoxysilane Textiles; Paper 0 Active
US9297118B2 Superamphiphobic paper Textiles; Paper 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.