Hydrothermal treatment of nanostructured films
US6787198B2 · kind B2 · utility
9Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2002 |
| Grant date | Sep 7, 2004 |
| Priority date | — |
| Expiry date | Jan 10, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/105
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.