Solvents and photoresist compositions for short wavelength imaging
US6787286B2 · kind B2 · utility
17Cited by
12References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2002 |
| Grant date | Sep 7, 2004 |
| Priority date | — |
| Expiry date | Jun 4, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/113
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.