Photosensitive polymers and resist compositions comprising the photosensitive polymers

US6787287B2 · kind B2 · utility

Assignee

• SAMSUNG ELECTRONICS CO., LTD. · KR

Inventors

• Hyun-Woo Kim · Cheongju-si, KR
• Sang-Gyun Woo · Yongin-si, KR
• Yool Kang · Yongin-si, KR

Key dates

• Filing date: Mar 25, 2002
• Grant date: Sep 7, 2004
• Expiry date: Aug 7, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/115
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A photosensitive polymer of a resist composition includes a copolymer of alkyl vinyl ether containing silicon and maleic anhydride, represented by the following formula: where R1 is —H, —OSi(CH3)2C(CH3)3 or —OSi(CH3)3; R2 is —H, —OH, —OCOCH3, —OSi(CH3)2C(CH3)3 or —OSi(CH(CH3)2)3; R3 is —H, —OH or —OCOCH3; R4 is —H, —OSi(CH3)2C(CH3)3, —CH2OSi(CH3)2C(CH3)3 or —CH2OSi(CH(CH3)2)3; and at least one of R1, R2, R3 and R4 is a Si-containing group.