Lithographic apparatus and device manufacturing method

US6788386B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Hendrikus Herman Marie Cox · Eindhoven, NL
• Frank Auer · Herbrechtingen, DE
• Marc Wilhelmus Maria Van Der Wijst · Veldhoven, NL
• Bastiaan Stephanus Hendricus Jansen · Waalre, NL
• Dominicus Jacobus Petrus Adrianus Franken · Veldhoven, NL

Key dates

• Filing date: Dec 19, 2002
• Grant date: Sep 7, 2004
• Expiry date: Dec 19, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/709
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.