High throughput vaporizer
US6789789B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2002 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Jul 16, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A two-stage vaporizer includes two vaporizing stages joined by a vaporization chamber located gravitationally below the first vaporizing stage and gravitationally above the second vaporizing stage. A separator covering an outlet within the vaporization chamber allows vaporized precursor from both vaporizing stages to pass through the outlet to chemical vapor deposition system and prevents any remaining liquid precursor from passing through the outlet. The liquid precursor is premixed with carrier gas just prior to entry into the vaporizer. Additional flows of carrier gas pass through the two vaporizing stages in opposite directions to carry the vaporized precursor to the outlet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.