Patent · US Expired

Lithographic apparatus, device manufacturing method, and device manufacturing thereby

US6791664B2 · kind B2 · utility

9Cited by
7References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 17, 2002
Grant dateSep 14, 2004
Priority date
Expiry dateApr 6, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/709
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Vibrational movement between the top of a lens and a main plate on which the lens is mounted is reduced by attaching between the lens and the main plate a lens support which detects relative movement between the lens and the main plates using piezoelectric sensors and compensates for that movement to reduce vibration using piezoelectric actuators which are in series with the piezoelectric sensors. The control signal which is generated to actuate the actuated piezoelectrics is generated by a controller.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.