Lithographic projection apparatus and device manufacturing method
US6791665B2 · kind B2 · utility
3Cited by
2References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2003 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Oct 17, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is provided wherein an object situated in a pulsed beam of radiation has an electrode in its vicinity and a voltage source connected either to the electrode or to the object. This configuration can provide a negative voltage pulse to the object relative to the electrode. The beam of radiation and the voltage pulse from the voltage source are provided in phase or out of phase. In this way, the object is shielded against secondary electrons generated by radiation beam illumination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.