Metrology diffraction signal adaptation for tool-to-tool matching
US6792328B2 · kind B2 · utility
34Cited by
5References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2002 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Dec 26, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and system in integrated circuit metrology for adapting a metrology system to work with diverse metrology devices. One embodiment is a method and system for generating signal adjustment data to adapt measured diffraction signals to enable use of a library of diffraction signals and structure profiles created for a different metrology device. Another embodiment is the creation and use of a data store of diffraction adjustment vectors and metrology device specifications relative to a reference device specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.